Changchun Institute of Optics,Fine Mechanics and Physics,CAS
The photoluminescence properties of ZnO : N films fabricated by thermally oxidizing Zn3N2 films using plasma-assisted metal-organic chemical vapour deposition | |
其他题名 | 论文其他题名 |
Wang D.![]() | |
2004 | |
发表期刊 | Journal of Physics-Condensed Matter
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ISSN | 0953-8984 |
卷号 | 16期号:25页码:4635-4642 |
摘要 | Nitrogen doped ZnO films are directly fabricated by the thermal oxidation of Zn3N2 films. Zn3N2 films are prepared by plasma-assisted metal-organic chemical vapour deposition (PA-MOCVD). By comparing with undoped ZnO photoluminescence spectra, a much stronger bound exciton emission due to a neutral nitrogen acceptor (A(0)X) is observed at low temperature. The neutral acceptor level is located at 130 meV above the valence band maximum. To demonstrate the quality of ZnO:N thin films as a p-type, a Zn3N2/n-Si heterojunction structure was first fabricated. With an increase of oxidation temperature, the structure has gradually shown p-n junction rectification characteristics from I-V measurements. |
收录类别 | SCI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25074 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Wang D.,Liu Y. C.,Mu R.,et al. The photoluminescence properties of ZnO : N films fabricated by thermally oxidizing Zn3N2 films using plasma-assisted metal-organic chemical vapour deposition[J]. Journal of Physics-Condensed Matter,2004,16(25):4635-4642. |
APA | Wang D..,Liu Y. C..,Mu R..,Zhang J. Y..,Lu Y. M..,...&Fan X. W..(2004).The photoluminescence properties of ZnO : N films fabricated by thermally oxidizing Zn3N2 films using plasma-assisted metal-organic chemical vapour deposition.Journal of Physics-Condensed Matter,16(25),4635-4642. |
MLA | Wang D.,et al."The photoluminescence properties of ZnO : N films fabricated by thermally oxidizing Zn3N2 films using plasma-assisted metal-organic chemical vapour deposition".Journal of Physics-Condensed Matter 16.25(2004):4635-4642. |
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