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Remarkable quality improvement of as-grown monolayer MoS2 by sulfur vapor pretreatment of SiO2/Si substrates 期刊论文
Nanoscale, 2020, 卷号: 12, 期号: 3, 页码: 1958-1966
Authors:  P. Yang,Y. B. Shan,J. Chen,G. Ekoya,J. K. Han,Z. J. Qiu,J. J. Sun,F. Chen,H. M. Wang,W. Z. Bao,L. G. Hu,R. J. Zhang,R. Liu and C. X. Cong
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