中文版 | English

在结果中检索

CIOMP OpenIR

浏览/检索结果: 共7条，第1-7条 帮助

限定条件        
已选(0)清除 条数/页：   排序方式：
Speckle pattern sequential extraction metric for estimating the focus spot size on a remote diffuse target 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 32
作者:  Yu, Z.;  Y. Y. Li;  L. S. Liu;  J. Guo;  T. F. Wang and G. Q. Yang
浏览  |  Adobe PDF(1473Kb)  |  收藏  |  浏览/下载：300/89  |  提交时间：2018/06/13
Study on a wideband, variable aperture, high resolution scatterometer for planar diffraction grating stray light measurement 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 2
作者:  Yang, J.;  R. Zhang;  L. Yin;  C. Sun and T. J. Li
浏览  |  Adobe PDF(1770Kb)  |  收藏  |  浏览/下载：267/74  |  提交时间：2018/06/13
Performance improvement of coherent free-space optical communication with quadrature phase-shift keying modulation using digital phase estimation 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 16
作者:  Li, X. L.;  T. W. Geng;  S. Ma;  Y. T. Li;  S. J. Gao and Z. Y. Wu
浏览  |  Adobe PDF(1220Kb)  |  收藏  |  浏览/下载：367/107  |  提交时间：2018/06/13
Correcting groove error in gratings ruled on a 500-mm ruling engine using interferometric control 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 21
作者:  Mi, X. T.;  H. L. Yu;  H. Z. Yu;  S. W. Zhang;  X. T. Li;  X. F. Yao;  X. D. Qi;  Bayinhedhig and Q. H. Wan
浏览  |  Adobe PDF(2137Kb)  |  收藏  |  浏览/下载：339/116  |  提交时间：2018/06/13
Positive dwell time algorithm with minimum equal extra material removal in deterministic optical surfacing technology 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 32
作者:  Li, L. X.;  D. L. Xue;  W. J. Deng;  X. Wang;  Y. Bai;  F. Zhang and X. J. Zhang
浏览  |  Adobe PDF(927Kb)  |  收藏  |  浏览/下载：268/73  |  提交时间：2018/06/13
High-precision identification of a tip-tilt control system for the compensation of time delay 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 5
作者:  Wang, Y. K.;  Z. L. Cao;  L. F. Hu;  X. Y. Zhang;  D. Y. Li;  H. Y. Xu;  S. X. Wang;  Q. Q. Mu and L. Xuan
浏览  |  Adobe PDF(2102Kb)  |  收藏  |  浏览/下载：292/67  |  提交时间：2018/06/13
Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance 期刊论文
Applied Optics, 2017, 卷号: 56, 期号: 26
作者:  Yu, B.;  C. S. Jin;  S. Yao;  C. Li;  Y. Liu;  F. Zhou;  B. Y. Guo;  H. Wang;  Y. Xie and L. P. Wang
Adobe PDF(1006Kb)  |  收藏  |  浏览/下载：287/102  |  提交时间：2018/06/13