CIOMP OpenIR

浏览/检索结果: 共1条,第1-1条 帮助

限定条件        
已选(0)清除 条数/页:   排序方式:
Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification 期刊论文
Microelectronic Engineering, 2014, 期号: 128, 页码: 59-65
作者:  Zhang Z. Q.;  Duan H. G.;  Wu Y. H.;  Zhou W. P.;  Liu C.;  Tang Y. G.;  Li H. W.
浏览  |  Adobe PDF(5066Kb)  |  收藏  |  浏览/下载:382/124  |  提交时间:2015/04/24