Wavefront measurements using the Ronchi test for high-NA lithography projection lenses

doi:10.1364/AO.488608

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	Wavefront measurements using the Ronchi test for high-NA lithography projection lenses
	X. Yu and J. Li
	2023
发表期刊	Applied Optics
ISSN	1559128X
卷号	62 期号:19 页码:5057-5063
摘要	The Ronchi test is widely used for wavefront measurements in advanced lithography tools, and a physical optics explanation of the Ronchi test based on scalar diffraction theory can be found in numerous publications.However, for high-numerical aperture (high-NA) lithography projection lenses, the vector nature of light should be considered when performing wavefront measurements, especially the effect of polarization aberrations on the wavefront test results. In this paper, a vector model for describing shearing interferometry for high-NA lithography projection lenses is established. In addition to considering the vector nature of light, the vector model also calculates the Ronchigram on the screen of a detector at any distance from a diffraction grating, as opposed to the distance restriction for the Fraunhofer diffraction approximation used by the existing methods. Using the developed mathematical model of theRonchi test, theRonchigrams of high-NA lithography projection lenses under non-polarized illumination are simulated, and the effect of the distance between the diffraction grating and the detection screen on the wavefront measurement accuracy are discussed. ©2023 Optica Publishing Group.
DOI	10.1364/AO.488608
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收录类别	sci ; ei
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文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/68123
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	X. Yu and J. Li. Wavefront measurements using the Ronchi test for high-NA lithography projection lenses[J]. Applied Optics,2023,62(19):5057-5063.
APA	X. Yu and J. Li.(2023).Wavefront measurements using the Ronchi test for high-NA lithography projection lenses.Applied Optics,62(19),5057-5063.
MLA	X. Yu and J. Li."Wavefront measurements using the Ronchi test for high-NA lithography projection lenses".Applied Optics 62.19(2023):5057-5063.

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