中国科学院长春光学精密机械与物理研究所

QQ客服 官方微博 反馈留言

	Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system
	Y. Li; S. Jiang; X. Chen; Z. Liu; W. Wang; Y. Song and Bayanheshig
	2023
发表期刊	Optics Express
ISSN	10944087
卷号	31期号:17页码:28145-28160
摘要	To improve the exposure contrast of the scanning beam interference lithography (SBIL) system, a mathematical model of scanning exposure that includes the direction error of the measurement mirror is established. The effect of the angle between the interference fringe direction and the X-axis measurement mirror direction on the exposure contrast is analyzed. An accurate method for interference fringe direction measurement based on the heterodyne interferometry measurement method of the metrology grating and phase shift interferometry is proposed. This method combines the diffraction characteristics of the metrology grating and the phase shift algorithm to calculate the angle between the interference fringe direction and the measurement mirror direction accurately and adjust it. Experiments show that this angle reaches 0.6777 µrad, which meets high-precision grating fabrication requirements. Exposure comparison experiments performed at various angles show that a smaller angle between the interference fringe direction and the measurement mirror direction leads to better grating groove production by scanning exposure, which is consistent with the theoretical analysis. The accuracy of the theoretical analysis and the feasibility of the interference fringe direction adjustment method are verified, laying a foundation for high-quality grating fabrication by the SBIL system. © 2023 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.
DOI	10.1364/OE.485488
URL	查看原文
收录类别	sci ; ei
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/67653
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Y. Li,S. Jiang,X. Chen,et al. Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system[J]. Optics Express,2023,31(17):28145-28160.
APA	Y. Li,S. Jiang,X. Chen,Z. Liu,W. Wang,&Y. Song and Bayanheshig.(2023).Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system.Optics Express,31(17),28145-28160.
MLA	Y. Li,et al."Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system".Optics Express 31.17(2023):28145-28160.

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Accurate measurement（3467KB）	期刊论文	出版稿	开放获取	CC BY-NC-SA	浏览 下载

个性服务

推荐该条目

保存到收藏夹

查看访问统计

导出为Endnote文件

谷歌学术

谷歌学术中相似的文章

[Y. Li]的文章

[S. Jiang]的文章

[X. Chen]的文章

百度学术

百度学术中相似的文章

[Y. Li]的文章

[S. Jiang]的文章

[X. Chen]的文章

必应学术

必应学术中相似的文章

[Y. Li]的文章

[S. Jiang]的文章

[X. Chen]的文章

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。