Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Van der Waals Epitaxy of c-Oriented Wurtzite AlGaN on Polycrystalline Mo Substrates for Enhanced Heat Dissipation | |
Y. Chen; H. Zang; S. L. Zhang; Z. M. Shi; J. W. Ben; K. Jiang; Y. P. Jia; M. R. Liu; D. B. Li and X. J. Sun | |
2022 | |
发表期刊 | Acs Applied Materials & Interfaces |
ISSN | 1944-8244 |
卷号 | 14期号:33页码:37947-37957 |
摘要 | The epitaxy of III-nitrides on metallic substrates is competitive due to the advantages of vertical carrier injection, enhanced heat dissipation, and flexible application in various III-nitride-based devices. However, the serious lattice mismatch, atom diffusion, and interface reaction under the rigorous growth conditions have caused enormous obstacles. Based on the thermal and chemical stability of the graphene layer, we propose the van der Waals epitaxy of c-oriented wurtzite AlGaN on the polycrystalline Mo substrate by high-temperature metal-organic chemical vapor deposition. The insertion of a graphene layer interrupts the chaotic epitaxial relationship between the polycrystalline metal and epilayers, resulting in the single-crystalline orientation along the wurtzite (0002) plane and residual stress release in AlGaN because of the weak van der Waals interaction. We also demonstrate that the epitaxy of AlGaN on Mo metal possesses enhanced heat dissipation ability, in which the epilayer temperature is controlled at only 28.7 degrees C by the heating of a similar to 54 degrees C hot plate. The heat dissipation enhancement for the present epitaxial structures provides a desirable strategy for the fabrication of efficient ultraviolet devices with excellent stability and lifetime. |
DOI | 10.1021/acsami.2c10039 |
URL | 查看原文 |
收录类别 | sci ; ei |
语种 | 英语 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/67227 |
专题 | 中国科学院长春光学精密机械与物理研究所 |
推荐引用方式 GB/T 7714 | Y. Chen,H. Zang,S. L. Zhang,et al. Van der Waals Epitaxy of c-Oriented Wurtzite AlGaN on Polycrystalline Mo Substrates for Enhanced Heat Dissipation[J]. Acs Applied Materials & Interfaces,2022,14(33):37947-37957. |
APA | Y. Chen.,H. Zang.,S. L. Zhang.,Z. M. Shi.,J. W. Ben.,...&D. B. Li and X. J. Sun.(2022).Van der Waals Epitaxy of c-Oriented Wurtzite AlGaN on Polycrystalline Mo Substrates for Enhanced Heat Dissipation.Acs Applied Materials & Interfaces,14(33),37947-37957. |
MLA | Y. Chen,et al."Van der Waals Epitaxy of c-Oriented Wurtzite AlGaN on Polycrystalline Mo Substrates for Enhanced Heat Dissipation".Acs Applied Materials & Interfaces 14.33(2022):37947-37957. |
条目包含的文件 | 下载所有文件 | |||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
Van der Waals Epitax(9063KB) | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论