CIOMP OpenIR
Three-dimensional metal semiconductor meta bipolar ultraviolet phototransistor based on GaN p-i-n epilayer
K. Jiang; X. J. Sun; Y. X. Chen; S. L. Zhang; J. W. Ben; Y. Chen; Z. H. Zhang; Y. P. Jia; Z. M. Shi and D. B. Li
2021
发表期刊Applied Physics Letters
ISSN0003-6951
卷号119期号:16页码:6
摘要GaN-based ultraviolet (UV) detectors have a considerable application potential in many fields. In this Letter, we report an alternative strategy to realize a high-optical-gain bipolar UV phototransistor based solely on a GaN p-i-n epilayer. The device consists of two tightly adjacent vertical p-i-n structures with a common n-type layer as a floating base. The collector and emitter electrodes are deposited on the two p-type mesas, forming a three-dimensional metal-semiconductor-metal (MSM) like photodetector. As a result, a peak responsivity of 11.7 A/W at a wavelength of 358 nm at 5 V is realized, corresponding to an optical gain of 40 with the assumption of 100% internal quantum efficiency. Different from traditional GaN-based n-p-i-n phototransistors, the optical gain of this detector originates from the accumulated electrons in the n-type floating base upon illumination, which can lower the barrier height between the base and emitter, leading to hole emission from the emitter. Although the structure of this phototransistor is similar to a planar back-to-back Schottky-type MSM photodetector, the response speed is much faster because the gain mainly results from carrier emission rather than MS interface defects. Published under an exclusive license by AIP Publishing.
DOI10.1063/5.0064779
URL查看原文
收录类别sci
语种英语
引用统计
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/67172
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
GB/T 7714
K. Jiang,X. J. Sun,Y. X. Chen,et al. Three-dimensional metal semiconductor meta bipolar ultraviolet phototransistor based on GaN p-i-n epilayer[J]. Applied Physics Letters,2021,119(16):6.
APA K. Jiang.,X. J. Sun.,Y. X. Chen.,S. L. Zhang.,J. W. Ben.,...&Z. M. Shi and D. B. Li.(2021).Three-dimensional metal semiconductor meta bipolar ultraviolet phototransistor based on GaN p-i-n epilayer.Applied Physics Letters,119(16),6.
MLA K. Jiang,et al."Three-dimensional metal semiconductor meta bipolar ultraviolet phototransistor based on GaN p-i-n epilayer".Applied Physics Letters 119.16(2021):6.
条目包含的文件 下载所有文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
Three-dimensional me(3040KB)期刊论文出版稿开放获取CC BY-NC-SA浏览 下载
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[K. Jiang]的文章
[X. J. Sun]的文章
[Y. X. Chen]的文章
百度学术
百度学术中相似的文章
[K. Jiang]的文章
[X. J. Sun]的文章
[Y. X. Chen]的文章
必应学术
必应学术中相似的文章
[K. Jiang]的文章
[X. J. Sun]的文章
[Y. X. Chen]的文章
相关权益政策
暂无数据
收藏/分享
文件名: Three-dimensional metal semiconductor meta bip.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。