中国科学院长春光学精密机械与物理研究所

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	Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array
	C. Liu; S. Y. Zhang; Y. Q. Liu; M. Y. Lu; W. H. Cao; L. Huang; H. Zhang; Z. F. Lu; Q. Q. Mu and H. Liu
	2022
发表期刊	Optics Express
ISSN	1094-4087
卷号	30期号:7页码:12014-12025
摘要	The combination of a digital micromirror device (DMD) lithography system and a rotatable polarizer provides a simple and convenient method to achieve the pixelated liquid crystal micropolarizer (LCMP) array for polarization imaging. In this paper, two crucial problems restricting the high-precision fabrication of LCMP array are pointed out and settled: the dislocation of LCMP pixels caused by parallelism error of the rotating polarizer and the grid defect caused by the gap between micromirrors. After correction, the maximum deviation of the fabricated LCMP pixels was reduced from 3.23 mu m to 0.11 mu m and the grid defect is eliminated. The correction method reported here lays a good foundation for the fine processing of liquid crystal devices with arbitrary photoalignment structure by using the DMD system. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
DOI	10.1364/oe.453800
URL	查看原文
收录类别	sci ; ei
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/66493
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	C. Liu,S. Y. Zhang,Y. Q. Liu,et al. Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array[J]. Optics Express,2022,30(7):12014-12025.
APA	C. Liu.,S. Y. Zhang.,Y. Q. Liu.,M. Y. Lu.,W. H. Cao.,...&Q. Q. Mu and H. Liu.(2022).Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array.Optics Express,30(7),12014-12025.
MLA	C. Liu,et al."Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array".Optics Express 30.7(2022):12014-12025.

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