Method for exposure dose monitoring and control in scanning beam interference lithography

doi:10.1364/AO.420870

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	Method for exposure dose monitoring and control in scanning beam interference lithography
	Y. Song; Y. Liu; S. Jiang; Y. Zhu; L. Zhang and Z. Liu
	2021
发表期刊	Applied Optics
ISSN	1559128X
卷号	60 期号:10 页码:2767-2774
摘要	To improve grating manufacturing process controllability in scanning beam interference lithography (SBIL), a novel method for exposure dose monitoring and control is proposed. Several zones in a narrow monitoring region are fabricated on a grating substrate by piecewise uniform scanning. Two monitoring modes are given based on the different widths of the monitoring region. The monitoring curve of the latent image diffraction efficiency to scanning velocity is calculated by rigorous coupled wave analysis. The calculation results show that the exposure dose in SBIL can be monitored by the shape change of the monitoring curve, and an optimized scanning velocity can be selected in the monitoring curve to control the exposure dose. 2021 Optical Society of America.
DOI	10.1364/AO.420870
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收录类别	SCI ; EI
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/65412
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Y. Song,Y. Liu,S. Jiang,et al. Method for exposure dose monitoring and control in scanning beam interference lithography[J]. Applied Optics,2021,60(10):2767-2774.
APA	Y. Song,Y. Liu,S. Jiang,Y. Zhu,&L. Zhang and Z. Liu.(2021).Method for exposure dose monitoring and control in scanning beam interference lithography.Applied Optics,60(10),2767-2774.
MLA	Y. Song,et al."Method for exposure dose monitoring and control in scanning beam interference lithography".Applied Optics 60.10(2021):2767-2774.

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