Changchun Institute of Optics,Fine Mechanics and Physics,CAS
| 2D III-Nitride Materials: Properties, Growth, and Applications | |
| J. Ben; X. Liu; C. Wang; Y. Zhang; Z. Shi; Y. Jia; S. Zhang; H. Zhang; W. Yu; D. Li and X. Sun | |
| 2021 | |
| Source Publication | Advanced Materials
 |
| ISSN | 9359648 |
| Volume | 33Issue:27 |
| Abstract | 2D III-nitride materials have been receiving considerable attention recently due to their excellent physicochemical properties, such as high stability, wide and tunable bandgap, and magnetism. Therefore, 2D III-nitride materials can be applied in various fields, such as electronic and photoelectric devices, spin-based devices, and gas detectors. Although the developments of 2D h-BN materials have been successful, the fabrication of other 2D III-nitride materials, such as 2D h-AlN, h-GaN, and h-InN, are still far from satisfactory, which limits the practical applications of these materials. In this review, recent advances in the properties, growth methods, and potential applications of 2D III-nitride materials are summarized. The properties of the 2D III-nitride materials are mainly obtained by first-principles calculations because of the difficulties in the growth and characterizations of these materials. The discussion on the growth of 2D III-nitride materials is focused on 2D h-BN and h-AlN, as the developments of 2D h-GaN and h-InN are yet to be realized. Therefore, applications have been realized mostly based on the 2D h-BN materials; however, many potential applications are cited for the entire range of 2D III-nitride materials. Finally, future research directions and prospects in this field are also discussed. 2021 Wiley-VCH GmbH |
| DOI | 10.1002/adma.202006761 |
| URL | 查看原文 |
| Indexed By | SCI ; EI |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ciomp.ac.cn/handle/181722/65008 |
| Collection | 中国科学院长春光学精密机械与物理研究所 |
| Recommended Citation GB/T 7714 | J. Ben,X. Liu,C. Wang,et al. 2D III-Nitride Materials: Properties, Growth, and Applications[J]. Advanced Materials,2021,33(27). |
| APA | J. Ben.,X. Liu.,C. Wang.,Y. Zhang.,Z. Shi.,...&D. Li and X. Sun.(2021).2D III-Nitride Materials: Properties, Growth, and Applications.Advanced Materials,33(27). |
| MLA | J. Ben,et al."2D III-Nitride Materials: Properties, Growth, and Applications".Advanced Materials 33.27(2021). |
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| 2D III-Nitride Mater（9996KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Download | |
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