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In situ fabrication of Al surface plasmon nanoparticles by metal-organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors
Y. Wu,X. J. Sun,Z. M. Shi,Y. P. Jia,K. Jiang,J. W. Ben,C. H. Kai,Y. Wang,W. Lu and D. B. Li
2020
发表期刊Nanoscale Advances
ISSN2516-0230
卷号2期号:5页码:1854-1858
摘要Al nanoparticles (NPs) have been proven to be the efficient choice for plasmon enhanced AlGaN-based ultraviolet (UV) photodetectors. Previous studies have mainly been focused on the ex situ preparation of Al NPs, but the in situ growth of Al NPs is more desired. In this work, we predict the feasibility for in situ growth of Al surface plasmon NPs on AlGaN-based UV photodetectors by first-principles calculations, and realized it experimentally by metal-organic chemical vapor deposition. For metal-semiconductor-metal type AlGaN-based photodetectors with in situ grown Al surface plasmons, the peak of responsivity was at 288 nm, enhanced 9 times more than that without Al NPs at 10 V bias. The in situ growth method of Al NPs in the present work provides an efficient method for improving the performance of AlGaN-based UV photoelectric devices.
DOI10.1039/d0na00022a
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收录类别SCI ; EI
语种英语
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文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/64601
专题中国科学院长春光学精密机械与物理研究所
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Y. Wu,X. J. Sun,Z. M. Shi,Y. P. Jia,K. Jiang,J. W. Ben,C. H. Kai,Y. Wang,W. Lu and D. B. Li. In situ fabrication of Al surface plasmon nanoparticles by metal-organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors[J]. Nanoscale Advances,2020,2(5):1854-1858.
APA Y. Wu,X. J. Sun,Z. M. Shi,Y. P. Jia,K. Jiang,J. W. Ben,C. H. Kai,Y. Wang,W. Lu and D. B. Li.(2020).In situ fabrication of Al surface plasmon nanoparticles by metal-organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors.Nanoscale Advances,2(5),1854-1858.
MLA Y. Wu,X. J. Sun,Z. M. Shi,Y. P. Jia,K. Jiang,J. W. Ben,C. H. Kai,Y. Wang,W. Lu and D. B. Li."In situ fabrication of Al surface plasmon nanoparticles by metal-organic chemical vapor deposition for enhanced performance of AlGaN deep ultraviolet detectors".Nanoscale Advances 2.5(2020):1854-1858.
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