High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse

doi:10.1038/s41377-020-0311-2

CIOMP OpenIR

	High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse
	T. T. Zou,B. Zhao,W. Xin,Y. Wang,B. Wang,X. Zheng,H. B. Xie,Z. Y. Zhang,J. J. Yang and C. L. Guo
	2020
发表期刊	Light-Science & Applications
ISSN	2047-7538
卷号	9 期号:1 页码:11
摘要	Micro/nanoprocessing of graphene surfaces has attracted significant interest for both science and applications due to its effective modulation of material properties, which, however, is usually restricted by the disadvantages of the current fabrication methods. Here, by exploiting cylindrical focusing of a femtosecond laser on graphene oxide (GO) films, we successfully produce uniform subwavelength grating structures at high speed along with a simultaneous in situ photoreduction process. Strikingly, the well-defined structures feature orientations parallel to the laser polarization and significant robustness against distinct perturbations. The proposed model and simulations reveal that the structure formation is based on the transverse electric (TE) surface plasmons triggered by the gradient reduction of the GO film from its surface to the interior, which eventually results in interference intensity fringes and spatially periodic interactions. Further experiments prove that such a regular structured surface can cause enhanced optical absorption (>20%) and an anisotropic photoresponse (-0.46 ratio) for the reduced GO film. Our work not only provides new insights into understanding the laser-GO interaction but also lays a solid foundation for practical usage of femtosecond laser plasmonic lithography, with the prospect of expansion to other two-dimensional materials for novel device applications.
DOI	10.1038/s41377-020-0311-2
URL	查看原文
收录类别	SCI ; EI
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/64581
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	T. T. Zou,B. Zhao,W. Xin,Y. Wang,B. Wang,X. Zheng,H. B. Xie,Z. Y. Zhang,J. J. Yang and C. L. Guo. High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse[J]. Light-Science & Applications,2020,9(1):11.
APA	T. T. Zou,B. Zhao,W. Xin,Y. Wang,B. Wang,X. Zheng,H. B. Xie,Z. Y. Zhang,J. J. Yang and C. L. Guo.(2020).High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse.Light-Science & Applications,9(1),11.
MLA	T. T. Zou,B. Zhao,W. Xin,Y. Wang,B. Wang,X. Zheng,H. B. Xie,Z. Y. Zhang,J. J. Yang and C. L. Guo."High-speed femtosecond laser plasmonic lithography and reduction of graphene oxide for anisotropic photoresponse".Light-Science & Applications 9.1(2020):11.

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
High-speed femtoseco（2032KB）	期刊论文	出版稿	开放获取	CC BY-NC-SA	浏览下载