High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography

doi:10.1364/ome.402937

CIOMP OpenIR

	High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography
	X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang
	2020
发表期刊	Optical Materials Express
ISSN	2159-3930
卷号	10 期号:10 页码:2406-2414
摘要	High-birefringence waveguide Bragg gratings for the C-band are fabricated in the Silica-on-Silicon platform with Displacement Talbot Lithography (DTL). Transmission and reflection spectrums of the Bragg wavelength splitting were measured and calculated. The birefringence here is up to 7.919x10(-4) to 1.670x10(-3), much higher than existing devices via other platforms. We illustrate the principle and advantage of DTL though theoretical analysis and numerical simulation. The birefringence of waveguide Bragg gratings here are customized with their device configuration (i.e., waveguide width and grating etched depth), enabling an effective method to construct scalable Silica-on-Silicon devices for highly linear-polarized external-cavity semiconductor lasers. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
DOI	10.1364/ome.402937
URL	查看原文
收录类别	SCI ; EI
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/64558
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang. High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography[J]. Optical Materials Express,2020,10(10):2406-2414.
APA	X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang.(2020).High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography.Optical Materials Express,10(10),2406-2414.
MLA	X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang."High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography".Optical Materials Express 10.10(2020):2406-2414.

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
High-birefringence w（1059KB）	期刊论文	出版稿	开放获取	CC BY-NC-SA	浏览下载