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EUV multilayer mirrors in solar X-EUV Imager
H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou
2020
发表期刊Optik
ISSN0030-4026
卷号204页码:8
摘要Fe XII line (19.5 nm) is one of important targets of imaging detection in solar spectrum, and 19.5 nm multilayer mirrors were employed to reflect 19.5 nm line and suppress sidelobe. 19.5 nm multilayer mirrors with a bandwidth of 1.0 nm are in demand in Solar X-EUV imager installed in FengYun III satellite. Thickness ratios of Mo layer of 0.15 and 0.11, respectively, are utilized in multilayer mirrors at normal and 45 degrees incidence. The influence of roughness/diffusion on reflectance is discussed, and profile changes of substrate after deposition are also analyzed.
DOI10.1016/j.ijleo.2020.164213
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收录类别SCI ; EI
语种英语
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文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/64502
专题中国科学院长春光学精密机械与物理研究所
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H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou. EUV multilayer mirrors in solar X-EUV Imager[J]. Optik,2020,204:8.
APA H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou.(2020).EUV multilayer mirrors in solar X-EUV Imager.Optik,204,8.
MLA H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou."EUV multilayer mirrors in solar X-EUV Imager".Optik 204(2020):8.
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