Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited)

doi:10.3788/IRLA20201077

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	Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited)
	H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang
	2020
发表期刊	Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering
ISSN	10072276
卷号	49 期号:12
摘要	Vertical-cavity surface-emitting lasers (VCSELs) have important applications in the short-distance optical interconnection attributed to their advantages, such as low cost, low threshold current, high modulation bandwidth and low power consumption. With the development of big-data and supercomputer technology, the performance demand of short-distance optical interconnection is increasing quickly, which also proposes a challenge for high-speed 850 nm VCSEL. In this paper, the latest development of high-speed 850 nm VCSEL technology was reviewed from the aspects of bandwidth-limited factors and new modulation methods, and the growing trend of this technology is prospected and summarized. Copyright 2020 Infrared and Laser Engineering. All rights reserved.
DOI	10.3788/IRLA20201077
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收录类别	EI
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文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/64291
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang. Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited)[J]. Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,2020,49(12).
APA	H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang.(2020).Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited).Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering,49(12).
MLA	H. Tong, C. Tong, Z. Wang, H. Lu, L. Wang, S. Tian and L. Wang."Advances in the technology of 850 nm high-speed vertical cavity surface emitting lasers (Invited)".Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering 49.12(2020).

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