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Passivation Mechanism of Nitrogen in ZnO under Different Oxygen Ambience
X.Y.Chen; Z.Z.Zhang; Y.Y.Zhang; B.Yao; B.H.Li; Q.Gong
2019
发表期刊Crystals
ISSN2073-4352
卷号9期号:4页码:7
摘要Nitrogen-doped ZnO thin films were grown on a-plane Al2O3 by plasma-assisted molecular beam epitaxy. Hall-effect measurements indicated that the nitrogen-doped ZnO films showed p-type behavior first, then n-type, with the growth conditions changing from oxygen-radical-rich to oxygen-radical-deficient ambience, accompanied with the increase of the N/O ratio in the plasmas. The increasing green emission in the low temperature photoluminescence spectra, related to single ionized oxygen vacancy in ZnO, was ascribed to the decrease of active oxygen atoms in the precursor plasmas. CN complex, a donor defect with low formation energy, was demonstrated to be easily introduced into ZnO under O-radical-deficient ambience, which compensated the nitrogen-related acceptor, along with the oxygen vacancy.
关键词molecular beam epitaxy,ZnO,dopant,defects,x-ray photoelectron,optical-properties,thin-films
DOI10.3390/cryst9040204
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收录类别SCI
语种英语
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文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/63447
专题中国科学院长春光学精密机械与物理研究所
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X.Y.Chen,Z.Z.Zhang,Y.Y.Zhang,et al. Passivation Mechanism of Nitrogen in ZnO under Different Oxygen Ambience[J]. Crystals,2019,9(4):7.
APA X.Y.Chen,Z.Z.Zhang,Y.Y.Zhang,B.Yao,B.H.Li,&Q.Gong.(2019).Passivation Mechanism of Nitrogen in ZnO under Different Oxygen Ambience.Crystals,9(4),7.
MLA X.Y.Chen,et al."Passivation Mechanism of Nitrogen in ZnO under Different Oxygen Ambience".Crystals 9.4(2019):7.
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