Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation

doi:10.1063/1.5080344

CIOMP OpenIR

	Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation
	Y.Z.He; J.H.Zhang; S.Singh; E.Garcell; A.Y.Vorobyev
	2019
发表期刊	Applied Physics Letters
ISSN	0003-6951
卷号	114 期号:13 页码:5
摘要	Controllable nanofabrication is at the very foundation of nano-science and nano-technology. Today, ultrafast laser writing has been broadly adopted for micro-fabrication because of its ability to make precise and rapid processing of almost all types of materials in an ambient environment. However, direct laser writing is typically unsuitable for high-quality 2D nano-patterning. In this work, we introduce a maskless laser nano-lithographic technique that allows us to create regular 2D periodic nanopatterns on glass. Glass is a particularly challenging material since it does not absorb light readily. Our strategy starts with a glass sample being coated with a thin layer of metal, and then irradiated with a series of pulse bursts at progressively increasing fluence levels. This process allows us to sequentially activate a series of tailored physical processes that lead to the formation of regular 2D periodic nanopatterns on glass. The formation mechanism of this nano-patterning is also simulated numerically and further corroborated by a series of control experiments. We also show controllability in forming various shapes and sizes of nanopatterns through tailored fluence doses. Our technique provides a high-speed and low-cost method for glass nanofabrication. Published under license by AIP Publishing.
关键词	femtosecond laser,pattern-formation,surface,metals,Physics
DOI	10.1063/1.5080344
URL	查看原文
收录类别	SCI ; EI
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/63330
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Y.Z.He,J.H.Zhang,S.Singh,et al. Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation[J]. Applied Physics Letters,2019,114(13):5.
APA	Y.Z.He,J.H.Zhang,S.Singh,E.Garcell,&A.Y.Vorobyev.(2019).Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation.Applied Physics Letters,114(13),5.
MLA	Y.Z.He,et al."Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation".Applied Physics Letters 114.13(2019):5.

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Maskless laser nano （1301KB）	期刊论文	出版稿	开放获取	CC BY-NC-SA	浏览下载