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Study on low-order aberration measurements of large-aperture flats based on scanning pentaprism technology
E.H.Qi; H.X.Hu; X.Luo
2019
发表期刊Applied Optics
ISSN1559-128X
卷号58期号:4页码:787-793
摘要Pentaprism scanning technology (PPS) is an absolute testing method that has the advantages of a simple structure and absolute testing without an extra reference flat, as well as being able to provide in situ surface measurements, and more. It plays an important role in the manufacturing process of large flat mirrors. For calibrating the PPS's uncertainty, this paper describes a multi-mode scanning method to implement the measurement of low-order aberrations and introduces the concept of an autocorrelation coefficient to evaluate the data processing progress. These improvements were applied to the measurement of a large flat mirror (1630 mm in diameter), which demonstrates that the measuring uncertainty of PPS can be about 20 nm rms. Furthermore, in regard to the special requirements of M3MP, the prototype mirror of M3M (the tertiary mirror) in the Thirty Meter Telescope project with a non-circular aperture, we analyzed the slope distribution of low-order aberrations, power, and astigmatism. The sample route lines of PPS are then reorganized and a new data process algorithm is implemented. This work was performed in order to improve the PPS's performance in measuring low-order aberrations of large flat mirrors. (C) 2019 Optical Society of America
关键词Optics
DOI10.1364/ao.58.000787
收录类别SCI ; EI
语种英语
引用统计
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/63116
专题中国科学院长春光学精密机械与物理研究所
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E.H.Qi,H.X.Hu,X.Luo. Study on low-order aberration measurements of large-aperture flats based on scanning pentaprism technology[J]. Applied Optics,2019,58(4):787-793.
APA E.H.Qi,H.X.Hu,&X.Luo.(2019).Study on low-order aberration measurements of large-aperture flats based on scanning pentaprism technology.Applied Optics,58(4),787-793.
MLA E.H.Qi,et al."Study on low-order aberration measurements of large-aperture flats based on scanning pentaprism technology".Applied Optics 58.4(2019):787-793.
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