Modeling multilayer coating profiles with defects on EUV collector with grating

doi:10.1117/1.Oe.58.10.107102

CIOMP OpenIR

	Modeling multilayer coating profiles with defects on EUV collector with grating
	S.Z.Sun; C.S.Jin; B.Yu; T.Guo; S.Yao; W.Y.Deng; C.Li
	2019
发表期刊	Optical Engineering
ISSN	0091-3286
卷号	58 期号:10 页码:9
摘要	Extreme ultraviolet lithography (EUVL) is recognized as a leading technology in next-generation lithography. Achieving spectral purification while ensuring extreme ultraviolet (EUV) reflectance is one of the key technologies for industrializing EUVL. An EUV collector mirror with phase grating can be used in the spectral purification of an EUVL source. However, it also induces a considerable loss of EUV. We propose a deposition model for calculating the multilayer coating profile on the surface of an EUV collector with grating based on a geometric line tracing method. In addition, it also analyzes the coating defects that influence the EUV reflectance, and the evolution of the coating defects with the grating positions. Experimental results reveal that the model accurately predicts the multilayer coating profile deposited on the surface of the collector, which helps improve how EUV collector is deposited. (C) 2019 Society of Photo-Optical Instrumentation Engineers (SPIE)
关键词	EUV collector with grating,multilayer coating profile,coating defects,deposition model,EUV reflectance,lithography,Optics
DOI	10.1117/1.Oe.58.10.107102
收录类别	SCI ; EI
语种	英语
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/63056
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	S.Z.Sun,C.S.Jin,B.Yu,et al. Modeling multilayer coating profiles with defects on EUV collector with grating[J]. Optical Engineering,2019,58(10):9.
APA	S.Z.Sun.,C.S.Jin.,B.Yu.,T.Guo.,S.Yao.,...&C.Li.(2019).Modeling multilayer coating profiles with defects on EUV collector with grating.Optical Engineering,58(10),9.
MLA	S.Z.Sun,et al."Modeling multilayer coating profiles with defects on EUV collector with grating".Optical Engineering 58.10(2019):9.

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