Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Study on top sulfur hyperdoping layer covering microstructured Si by fs-laser irradiation | |
K.Wang; J.S.Gao; H.G.Yang; X.Y.Wang; Y.C.Wang; Z.Zhang | |
2019 | |
发表期刊 | Applied Surface Science |
ISSN | 0169-4332 |
卷号 | 464页码:502-508 |
摘要 | We studied the infrared absorption of a top sulfur hyperdoping layer covering an fs-laser irradiated microstructured Si substrate. To clarify the hyperdoping concentration distributions, and to find out how the top hyperdoping layer affects infrared absorption from 1200 to 2000 nm, a continuous etching treatment was utilized. Then we interpreted the thermal stabilization of both infrared absorption and sulfur hyperdoping concentration. The fundamental cause for infrared-absorption degradation under thermal annealing was explained. Furthermore, we discussed in detail how the interaction between the top hyperdoping layer and surface microstructure contributed to the high infrared absorption by a series of theoretical simulations using a finitedifference time-domain method. A strong localization of an incident electromagnetic wave was observed around the top sulfur hyperdoping layer covering microstructured Si, which played a critical role in improving infrared absorption. The results in this paper are especially beneficial to the subsequent fabrication of photoelectric devices and infrared response improvement. |
关键词 | Sulfur hyperdoping,Silicon,Femtosecond laser,Infrared absorption,infrared-absorption,silicon,photodetection,donor,Chemistry,Materials Science,Physics |
DOI | 10.1016/j.apsusc.2018.09.125 |
收录类别 | SCI ; EI |
语种 | 英语 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/63006 |
专题 | 中国科学院长春光学精密机械与物理研究所 |
推荐引用方式 GB/T 7714 | K.Wang,J.S.Gao,H.G.Yang,et al. Study on top sulfur hyperdoping layer covering microstructured Si by fs-laser irradiation[J]. Applied Surface Science,2019,464:502-508. |
APA | K.Wang,J.S.Gao,H.G.Yang,X.Y.Wang,Y.C.Wang,&Z.Zhang.(2019).Study on top sulfur hyperdoping layer covering microstructured Si by fs-laser irradiation.Applied Surface Science,464,502-508. |
MLA | K.Wang,et al."Study on top sulfur hyperdoping layer covering microstructured Si by fs-laser irradiation".Applied Surface Science 464(2019):502-508. |
条目包含的文件 | 下载所有文件 | |||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
Study on top sulfur (2354KB) | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 |
个性服务 |
推荐该条目 |
保存到收藏夹 |
查看访问统计 |
导出为Endnote文件 |
谷歌学术 |
谷歌学术中相似的文章 |
[K.Wang]的文章 |
[J.S.Gao]的文章 |
[H.G.Yang]的文章 |
百度学术 |
百度学术中相似的文章 |
[K.Wang]的文章 |
[J.S.Gao]的文章 |
[H.G.Yang]的文章 |
必应学术 |
必应学术中相似的文章 |
[K.Wang]的文章 |
[J.S.Gao]的文章 |
[H.G.Yang]的文章 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论