Damage Characteristics of CaF2 Crystals with Different Planes Irradiated by 355-nm Pulse Laser

doi:10.3788/CJL201946.1103001

CIOMP OpenIR

	Damage Characteristics of CaF2 Crystals with Different Planes Irradiated by 355-nm Pulse Laser
	Z.Xu; X.Peng; Y.Zhao; D.Li; R.Liu; L.Su; J.Shao
	2019
发表期刊	Zhongguo Jiguang/Chinese Journal of Lasers
ISSN	02587025
卷号	46 期号:11
摘要	The laser damage characteristics of calcium fluoride (CaF2) crystals with various lattice planes irradiated by 355-nm pulse laser are investigated. Further, the damage thresholds and damage morphologies of three different lattice planes, i.e., (100), (110), and (111), are measured under a 7.8-ns pulse laser irradiation. In addition, the photothermal absorption is evaluated by using the surface thermal lensing technique. The (111) CaF2 crystal exhibits the highest photothermal absorption and lowest laser damage threshold. The (111) damage morphology comprises a melt pit, which is accompanied by lamellar peeling, indicating that this plane is easily cleaved by the 355-nm laser. The (100) and (110) damage morphologies also comprise a melt pit; however, the damage threshold and photothermal absorption have no clear correlation with the two lattice planes. 2019, Chinese Lasers Press. All right reserved.
关键词	Fluorine compounds,Calcium fluoride,Chromium compounds,Fluorspar,Laser damage,Materials,Morphology
DOI	10.3788/CJL201946.1103001
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收录类别	EI
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/62907
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Z.Xu,X.Peng,Y.Zhao,et al. Damage Characteristics of CaF2 Crystals with Different Planes Irradiated by 355-nm Pulse Laser[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2019,46(11).
APA	Z.Xu.,X.Peng.,Y.Zhao.,D.Li.,R.Liu.,...&J.Shao.(2019).Damage Characteristics of CaF2 Crystals with Different Planes Irradiated by 355-nm Pulse Laser.Zhongguo Jiguang/Chinese Journal of Lasers,46(11).
MLA	Z.Xu,et al."Damage Characteristics of CaF2 Crystals with Different Planes Irradiated by 355-nm Pulse Laser".Zhongguo Jiguang/Chinese Journal of Lasers 46.11(2019).

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