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Photoelectric Properties of N Doped MgZnO Thin Films
P.-C.Zhao; Z.-Z.Zhang; B.Yao; B.-H.Li; X.-L.Li
2019
发表期刊Faguang Xuebao/Chinese Journal of Luminescence
ISSN10007032
卷号40期号:8页码:956-960
摘要ZnO is an excellent UV light-emitting and lasing materials. Nitrogen is considered to be the ideal acceptor dopant for p-type ZnO and MgZnO. However, the lattice integrity of the nitrogen-doped samples grown at the lower growth temperature is remarkably influenced, which results in a further decrease in the carrier mobility of the zinc oxide. In order to study the effect of N doped MgZnO films, N-doped ZnO and MgZnO thin films were grown on sapphire substrate by molecular beam epitaxy. Comparing the difference between N doped MgZnO and ZnO, the experimental results show that the carrier mobility increased significantly when the Mg source temperature was 245 and 255, which is attributed to the fact that Mg-N bonding alleviates the formation of N-N pairs on the oxygen sites and relieves the lattice distortion. At the same time, the donor concentration in N-doped ZnO thin films can be reduced by one order of magnitude when the Mg source temperature is 275, which is advantageous for p-type doping. 2019, Science Press. All right reserved.
关键词Thin films,Carrier mobility,II-VI semiconductors,Light emission,Magnesium,Molecular beam epitaxy,Molecular beams,Nitrogen,Photoelectricity,Sapphire,Semiconductor alloys,Semiconductor doping,Zinc oxide
DOI10.3788/fgxb20194008.0956
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收录类别EI
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文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/62754
专题中国科学院长春光学精密机械与物理研究所
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P.-C.Zhao,Z.-Z.Zhang,B.Yao,et al. Photoelectric Properties of N Doped MgZnO Thin Films[J]. Faguang Xuebao/Chinese Journal of Luminescence,2019,40(8):956-960.
APA P.-C.Zhao,Z.-Z.Zhang,B.Yao,B.-H.Li,&X.-L.Li.(2019).Photoelectric Properties of N Doped MgZnO Thin Films.Faguang Xuebao/Chinese Journal of Luminescence,40(8),956-960.
MLA P.-C.Zhao,et al."Photoelectric Properties of N Doped MgZnO Thin Films".Faguang Xuebao/Chinese Journal of Luminescence 40.8(2019):956-960.
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