Illumination uniformity improvement in digital micromirror device based scanning photolithography system

doi:10.1364/oe.26.018597

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	Illumination uniformity improvement in digital micromirror device based scanning photolithography system
	Xiong, Z.; Liu, H.; Chen, R. H.; Xu, J.; Li, Q. K.; Li, J. H.; Zhang, W. J.
	2018
发表期刊	Optics Express
ISSN	1094-4087
卷号	26 期号:14 页码:18597-18607
摘要	Illumination uniformity in photolithography systems determines the dimensional difference across the entire lithographic substrate. However, traditional lithography system relies on expensive and complex illumination system for achieving uniform illumination. In this paper, we propose a simple and cost-effective method based on the modulation of digital micromirror device to improve illumination uniformity. The modulation according to a digital mask achieved via an iteration program improves the uniformity to be above 95%. We demonstrate the effectiveness of the method by experimentally fabricating a linear grating. By implementing this method, the maximum dimensional difference is decreased from 3.3 mu m to 0.3 mu m. Further simulations indicate that higher uniformity is achievable once the field of view on the DMD is divided into smaller subregions. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
关键词	maskless lithography dmd fabrication elements Optics
DOI	10.1364/oe.26.018597
收录类别	SCI ; EI
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/61025
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Xiong, Z.,Liu, H.,Chen, R. H.,et al. Illumination uniformity improvement in digital micromirror device based scanning photolithography system[J]. Optics Express,2018,26(14):18597-18607.
APA	Xiong, Z..,Liu, H..,Chen, R. H..,Xu, J..,Li, Q. K..,...&Zhang, W. J..(2018).Illumination uniformity improvement in digital micromirror device based scanning photolithography system.Optics Express,26(14),18597-18607.
MLA	Xiong, Z.,et al."Illumination uniformity improvement in digital micromirror device based scanning photolithography system".Optics Express 26.14(2018):18597-18607.

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