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Fabrication of a high-accuracy phase-type computer-generated hologram by physical vapor deposition
Zhang, Z. Y.; Wang, R. Q.; Hao, T.; Guo, C. L.; Xue, D. L.; Zhang, X. J.
2018
发表期刊Applied Optics
ISSN1559-128X
卷号57期号:34页码:F31-F36
摘要With the development of optical systems used in astronomical and earth observation, aspherical and free-form surfaces are increasingly used because they are lightweight and have improved image quality. As a highly accurate, aberrationless technique, computer-generated hologram (CGH) plays an important role in wavefront testing. At present, the main way to fabricate phase CGH is reactive ion etching, which suffers from low accuracy. To improve the accuracy, physical vapor deposition (PVD) is applied in the fabrication of phase CGH. The wavefront errors of PVD-fabricated phase CGH were analyzed. Testing results indicate that the wavefront error of the CGH is 0.020 lambda root mean square (RMS), mainly caused by the machine tool orthogonality error rather than the PVD process. The diffraction efficiency of the +1st order is 22.4%. (C) 2018 Optical Society of America
关键词Optics
DOI10.1364/ao.57.000f31
收录类别SCI ; EI
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文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/60990
专题中国科学院长春光学精密机械与物理研究所
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GB/T 7714
Zhang, Z. Y.,Wang, R. Q.,Hao, T.,et al. Fabrication of a high-accuracy phase-type computer-generated hologram by physical vapor deposition[J]. Applied Optics,2018,57(34):F31-F36.
APA Zhang, Z. Y.,Wang, R. Q.,Hao, T.,Guo, C. L.,Xue, D. L.,&Zhang, X. J..(2018).Fabrication of a high-accuracy phase-type computer-generated hologram by physical vapor deposition.Applied Optics,57(34),F31-F36.
MLA Zhang, Z. Y.,et al."Fabrication of a high-accuracy phase-type computer-generated hologram by physical vapor deposition".Applied Optics 57.34(2018):F31-F36.
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