Active lens for thermal aberration compensation in lithography lens

doi:10.1364/ao.57.008654

CIOMP OpenIR

	Active lens for thermal aberration compensation in lithography lens
	Zhao, L.; Dong, L. J.; Yu, X. F.; Li, P. Z.; Qiao, Y. F.
	2018
发表期刊	Applied Optics
ISSN	1559-128X
卷号	57 期号:29 页码:8654-8663
摘要	High laser absorption and strong resolution enhancement technology make thermal aberration control of lithography lenses more challenging. We present an active lens that uses four bellows actuators to generate astigmatism (Z5) on the lens surface. The apparatus utilizes optical path difference to compensate the system wavefront. In order to assess the specifications of the compensator, the finite element method and experimental analyses are carried out to obtain and validate the general properties of the apparatus. The results show that the Z5 deformation quantity of lens's upper surface exceeds 600 nm; further, Z5 coefficient accuracy is better than +/- 1 nm. The apparatus can be an efficient compensator for thermal aberration compensation, especially aberration caused by the dipole illumination. (C) 2018 Optical Society of America
关键词	adaptive optics deformable mirror performance simulation systems design Optics
DOI	10.1364/ao.57.008654
收录类别	SCI ; EI
引用统计
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/60888
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Zhao, L.,Dong, L. J.,Yu, X. F.,et al. Active lens for thermal aberration compensation in lithography lens[J]. Applied Optics,2018,57(29):8654-8663.
APA	Zhao, L.,Dong, L. J.,Yu, X. F.,Li, P. Z.,&Qiao, Y. F..(2018).Active lens for thermal aberration compensation in lithography lens.Applied Optics,57(29),8654-8663.
MLA	Zhao, L.,et al."Active lens for thermal aberration compensation in lithography lens".Applied Optics 57.29(2018):8654-8663.

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