CIOMP OpenIR
Trajectory-fitting and testing error analysis of stage for curved grating etching
Shen, Chen; Tan, Xin; Zhu, Ji-Wei; Zhang, Wei; Qi, Xiang-Dong
2018
发表期刊Guangxue Jingmi Gongcheng/Optics and Precision Engineering
ISSN1004924X
卷号26期号:3页码:588-596
摘要To manufacture curved surface gratings with highly consistent blazing angles, the curve-fitting motion of the three-dimensional (3D) stage is essential. Therefore, an investigation of the 3D stage was performed based on a control algorithm for the curved blazed grating etching system. First, a concept of the 3D stage of the curved blazed grating etching system was introduced. Subsequently, according to the actual requirement of the etching machine, the theoretical calculating method for the track of the stage was provided. Then, the arc-fitting algorithm of the stage was proposed and the curve-fitting motion of the stage was performed. Finally, the actual motion tracks of the 3D stage were measured and compared with ideal tracks. Experimental results demonstrate that the cumulative positioning error of the linear fitting motion of the stage after 15 cycles is less than 0.218 mm, and the slope angle error is less than 0.02; the cumulative positioning error of the curve fitting motion of the stage after 40 cycles is less than 0.2 mm and the rotating angle error is in the range of -0.2-0.1. This method has realized the function of scanning etching and oscillating etching of the 3D stage. The stability, accuracy, and interference rejection of the stage satisfy the processing requirements. 2018, Science Press. All right reserved.
关键词Curve fitting Diffraction gratings Errors Etching
DOI10.3788/OPE.20182603.0588
收录类别EI
引用统计
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/60844
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
GB/T 7714
Shen, Chen,Tan, Xin,Zhu, Ji-Wei,et al. Trajectory-fitting and testing error analysis of stage for curved grating etching[J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering,2018,26(3):588-596.
APA Shen, Chen,Tan, Xin,Zhu, Ji-Wei,Zhang, Wei,&Qi, Xiang-Dong.(2018).Trajectory-fitting and testing error analysis of stage for curved grating etching.Guangxue Jingmi Gongcheng/Optics and Precision Engineering,26(3),588-596.
MLA Shen, Chen,et al."Trajectory-fitting and testing error analysis of stage for curved grating etching".Guangxue Jingmi Gongcheng/Optics and Precision Engineering 26.3(2018):588-596.
条目包含的文件 下载所有文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
Trajectory-fitting a(1093KB)期刊论文出版稿开放获取CC BY-NC-SA浏览 下载
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Shen, Chen]的文章
[Tan, Xin]的文章
[Zhu, Ji-Wei]的文章
百度学术
百度学术中相似的文章
[Shen, Chen]的文章
[Tan, Xin]的文章
[Zhu, Ji-Wei]的文章
必应学术
必应学术中相似的文章
[Shen, Chen]的文章
[Tan, Xin]的文章
[Zhu, Ji-Wei]的文章
相关权益政策
暂无数据
收藏/分享
文件名: Trajectory-fitting and testing error analysis.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。