Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography

	Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
	Xue, C. F.; J. Zhao; Y. Q. Wu; H. N. Yu; S. M. Yang; L. S. Wang; W. C. Zhao; Q. Wu; Z. C. Zhu; B. Liu; X. Zhang; W. C. Zhou and R. Z. Tai
	2017
发表期刊	Applied Surface Science
卷号	425
摘要	Periodic nanostructures have attracted considerable interest and been applied in many fields. However, nanostructures of sufficiently large areas and depths are necessary for the development of practical devices. In this study, large-area high-aspect-ratio periodic nanostructures were fabricated by using a hybrid technology based on X-ray interference lithography, and then the patterns were transferred onto various substrates successfully. The final periodic nanostructures on the substrate attained measurements up to square centimetres with depths greater than 200 nm. (C) 2017 Elsevier B.V. All rights reserved.
收录类别	sci ; ei
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/59361
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Xue, C. F.,J. Zhao,Y. Q. Wu,et al. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography[J]. Applied Surface Science,2017,425.
APA	Xue, C. F..,J. Zhao.,Y. Q. Wu.,H. N. Yu.,S. M. Yang.,...&W. C. Zhou and R. Z. Tai.(2017).Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography.Applied Surface Science,425.
MLA	Xue, C. F.,et al."Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography".Applied Surface Science 425(2017).

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