Impact of carbon contamination cleaning technologies on reflectivity of extreme ultraviolet lithography optics

	Impact of carbon contamination cleaning technologies on reflectivity of extreme ultraviolet lithography optics
	Wang, Y.; Q. Lu and Y. Gao
	2017
发表期刊	Zhongguo Jiguang/Chinese Journal of Lasers
卷号	44 期号:3
摘要	The carbon contamination of extreme ultraviolet lithography system will degrade the reflectivity of multilayer. On the premise of guaranteeing the performances of optics,how to choose the carbon cleaning process is an important project. By analyzing the principle of various cleaning methods process theory, it is revealed that the influences of different technologies on the reflectivity of multilayer mainly are film oxidation, etching and surface roughness degradation. On the base of finite difference time domain and total integrated scattering theory, the relation between various influence factors and reflectivity of multilayer is studied. Results show that film oxidation and surface roughness degradation are main factors that result in decrease of the reflectivity of multilayer, while the influence for etching is minor. Based on the above analysis results, both radio frequency hydrogen plasma and atomic hydrogen cleaning technologies will not reduce the performances of optics and can be adopted as prior options, while the carbon contamination at the surface of optics is removed. 2017, Chinese Lasers Press. All right reserved.
收录类别	ei
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/59295
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang, Y.,Q. Lu and Y. Gao. Impact of carbon contamination cleaning technologies on reflectivity of extreme ultraviolet lithography optics[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2017,44(3).
APA	Wang, Y.,&Q. Lu and Y. Gao.(2017).Impact of carbon contamination cleaning technologies on reflectivity of extreme ultraviolet lithography optics.Zhongguo Jiguang/Chinese Journal of Lasers,44(3).
MLA	Wang, Y.,et al."Impact of carbon contamination cleaning technologies on reflectivity of extreme ultraviolet lithography optics".Zhongguo Jiguang/Chinese Journal of Lasers 44.3(2017).

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