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Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
Wang, W.; S. Jiang; Y. Song and Bayanheshig
2017
Source PublicationZhongguo Jiguang/Chinese Journal of Lasers
Volume44Issue:9
AbstractIn a scanning beam interference lithography (SBIL) system, the exposure spot size has significant influence on the stitching accuracy of interference fringes, efficiency of grating fabrication and quality of interference field. In order to obtain a reasonable exposure spot size, the influence of exposure spot size on nonlinear error of interference fringe, line stitching error and exposure contrast is discussed by numerical simulation based on the transmission law of Gaussian beam and scanning stitching mathematical model. Results show that, compared with the large-sized spot, the small exposure spot is more conducive to controlling nonlinear error of interference fringe. Because there exists periodic measurement error, a small exposure spot helps to reduce the line error after stitching and enhance the exposure contrast. The exposure optical path of SBIL system is designed and optimized. The left and right spot morphologies of interference field and the nonlinear error of interference fringe phase are measured. Results show that the waist radius of exposure spot is about 0.9 mm, and the nonlinear error peak-valley value of interference fringe phase is 21.8 nm. 2017, Chinese Lasers Press. All right reserved.
Indexed Byei
Language中文
Document Type期刊论文
Identifierhttp://ir.ciomp.ac.cn/handle/181722/59278
Collection中科院长春光机所知识产出
Recommended Citation
GB/T 7714
Wang, W.,S. Jiang,Y. Song and Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2017,44(9).
APA Wang, W.,S. Jiang,&Y. Song and Bayanheshig.(2017).Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System.Zhongguo Jiguang/Chinese Journal of Lasers,44(9).
MLA Wang, W.,et al."Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System".Zhongguo Jiguang/Chinese Journal of Lasers 44.9(2017).
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