Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model

	Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model
	Liu, Z. W.; S. Jiang; X. T. Li; Y. Song; W. H. Li and Bayanheshig
	2017
发表期刊	Optics Express
卷号	25 期号:9
摘要	A profile of an X-axis stage mirror results in a phase error of gratings in Scanning Beam Interference Lithography. Traditional methods of measuring the profile require extra probes and another large stage mirror on Y-axis, or requires other operations such as rotating measured object to adjust the zero-adjustment errors. This paper introduces a three-probe system removing the need for Y-axis optical path structure and proposes a bidirectional integration model to solve the problem of zero-adjustment error, simplifying the optical path structure and the measurement process. This method is confirmed by theoretical analysis and experimental results, which is better than traditional methods and can also be used in other application fields of three-point method. (C) 2017 Optical Society of America
收录类别	sci ; ei
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/59110
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Liu, Z. W.,S. Jiang,X. T. Li,et al. Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model[J]. Optics Express,2017,25(9).
APA	Liu, Z. W.,S. Jiang,X. T. Li,Y. Song,&W. H. Li and Bayanheshig.(2017).Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model.Optics Express,25(9).
MLA	Liu, Z. W.,et al."Precision measurement of X-axis stage mirror profile in scanning beam interference lithography by three-probe system based on bidirectional integration model".Optics Express 25.9(2017).

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