Electrostatic field assisted micro imprint lithography technology

	Electrostatic field assisted micro imprint lithography technology
	Liu, M.-Z.; T.-S. Wang; H.-F. Li; Z.-Y. Liu; Z.-L. Chen and W.-X. Yu
	2017
发表期刊	Guangxue Jingmi Gongcheng/Optics and Precision Engineering
卷号	25 期号:3
摘要	In this paper, a new type of micro imprint lithography assisted by electrostatic field was introduced, and an in-depth theoretical research was conducted on its technological process. First, numerical simulation software (COMSOLTMMultiphysics) was adopted to establish a transient simulation model for electrostatic filed assisted imprint lithography and discussed the evolution process of micro structure in different time domains. Then a detailed analysis was conducted on the qualitative relationship between the micro structure formation and simulation experiment parameters, during which it was found that properly reducing the polar plate spacing, template bulging period and increasing the bulging height, initial polymer film thickness and voltage were beneficial to formation of the micro-nano structure. Finally, a spherical cap micro structure with 31 m hollow structure was obtained through optimization of the simulation experiment parameters. Compared with traditional imprint method, the electrostatic field assisted micro imprint, which is characterized by simple process and lower cost, can be widely applied to the micro electronic and mechanical system, photonics, genetics and tissue system etc. 2017, Science Press. All right reserved.
收录类别	ei
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/59085
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Liu, M.-Z.,T.-S. Wang,H.-F. Li,et al. Electrostatic field assisted micro imprint lithography technology[J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering,2017,25(3).
APA	Liu, M.-Z.,T.-S. Wang,H.-F. Li,Z.-Y. Liu,&Z.-L. Chen and W.-X. Yu.(2017).Electrostatic field assisted micro imprint lithography technology.Guangxue Jingmi Gongcheng/Optics and Precision Engineering,25(3).
MLA	Liu, M.-Z.,et al."Electrostatic field assisted micro imprint lithography technology".Guangxue Jingmi Gongcheng/Optics and Precision Engineering 25.3(2017).

条目包含的文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Electrostatic field （947KB）	期刊论文	作者接受稿	开放获取	CC BY-NC-SA	浏览请求全文