Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating | |
Feng, Y. X.; Y. X. Meng; G. Y. Zhang; Y. H. Wu and P. Hao | |
2017 | |
发表期刊 | Spectroscopy and Spectral Analysis |
卷号 | 37期号:9 |
摘要 | Fluorescence conversion film produced through the entrance window of silicon substrate detector is an effective method to reduce the cost of ultraviolet fluorescence enhancement technology. We theoretically discussed the relationship between spin coating process parameters and properties of UV fluorescence film, a colloid admixture of polydimethylsiloxane and pigment yellow 101. To make further efforts, we set up an experimental platform for the performance measurement of UV fluorescent films, then optimized the mass ratio and spin speed of the spin coating process parameters for the films. There are two primary parameters evaluating spectral analysis detector: one is spectral response sensitivity, the other is spectral resolution. The analysis and experimental results show that the spin speed of making fluorescence films by spin-coating will directly affect the thickness, surface roughness of the film and distribution of fluorescence material, which then affects the resolution of the spectrum analysis system. The efficiency of the UV fluorescence enhanced film is closely related to the mass ratio of fluorescent solvent polydimethylsiloxane and fluorescent material pigment yellow 101. Low mass ratio cannot enhance UV-responsive sensitivity, but high mass ratio and the self fluorescence-quecher effect will reduce it. Eventually, we prepared UV fluorescence enhancement films based on the optimization of film spin coating process. The spin-coating speed was 2 500 to 3 000 r center dot min(-1) and the mass ratio of the fluorescent substance to the fluorescent solvent was 7%. The characteristic spectrum testing results of the mercury lamp indicated that after coating films, UV-responsive sensitivity was improved nearly 1.6 times at 313 nm. Analyzing FWHM of characteristic spectrum with and without coating film, we discovered that there was no effect after coating. |
收录类别 | sci ; ei |
语种 | 中文 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/58898 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Feng, Y. X.,Y. X. Meng,G. Y. Zhang,et al. Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating[J]. Spectroscopy and Spectral Analysis,2017,37(9). |
APA | Feng, Y. X.,Y. X. Meng,G. Y. Zhang,&Y. H. Wu and P. Hao.(2017).Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating.Spectroscopy and Spectral Analysis,37(9). |
MLA | Feng, Y. X.,et al."Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating".Spectroscopy and Spectral Analysis 37.9(2017). |
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Process Optimization(2788KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 |
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