Research on temperature distribution of deep ultraviolet lithographic projection objective

	Research on temperature distribution of deep ultraviolet lithographic projection objective
	Yao, C. and Y. Gong
	2016
发表期刊	Zhongguo Jiguang/Chinese Journal of Lasers
卷号	43 期号:5
摘要	High precision lithographic projected objective suffers from thermal aberrations due to energy absorption. Under off-axis illumination, the dipole mode and time-changing thermal astigmatism is outstanding, which cannot be corrected or compensated by traditional passive optical systems. Active optics using mechanical actuators to compensate the primary thermal astigmatism of deformed lens in a refractive lithographic objective system is proposed. The actuators are located on a refractive plate, and the finite element analysis is applied to study the deformation and aberration. The theoretical analysis by geometrical optics is made to prove the feasibility for compensation, and the influences of actuator locations, active force loads, actuator size and lens supporting conditions are considered. The results show that the active plate performs well to compensate primary astigmatism and primary 4-foil aberration under the optimized supporting conditions, which provides an idea for thermal aberration control in lithographic systems. 2016, Chinese Lasers Press. All right reserved.
文章类型	期刊
收录类别	EI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/57363
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Yao, C. and Y. Gong. Research on temperature distribution of deep ultraviolet lithographic projection objective[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2016,43(5).
APA	Yao, C. and Y. Gong.(2016).Research on temperature distribution of deep ultraviolet lithographic projection objective.Zhongguo Jiguang/Chinese Journal of Lasers,43(5).
MLA	Yao, C. and Y. Gong."Research on temperature distribution of deep ultraviolet lithographic projection objective".Zhongguo Jiguang/Chinese Journal of Lasers 43.5(2016).

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