Beam alignment and convergence analysis of scanning beam interference lithography systems

	Beam alignment and convergence analysis of scanning beam interference lithography systems
	Wang, W.; Bayanheshig; Y. Song; S. Jiang and M. Pan
	2016
发表期刊	Zhongguo Jiguang/Chinese Journal of Lasers
卷号	43 期号:12
摘要	High-power broad-area (BA) diode lasers often suffer from low beam quality, broad linewidth, and a widened slow-axis far field with increasing current. In this paper, a two-dimensional current-modulated structure is proposed and it is demonstrated that it can reduce not only the far-field sensitivity to the injection current but also the linewidth of the lasing spectra. Injection-insensitive lateral divergence was realized, and the beam parameter product (BPP) was improved by 36.5%. At the same time, the linewidth was decreased by about 45% without significant degradations of emission power and conversion efficiency. (C) 2016 The Japan Society of Applied Physics
文章类型	期刊
收录类别	EI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/57245
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang, W.,Bayanheshig,Y. Song,et al. Beam alignment and convergence analysis of scanning beam interference lithography systems[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2016,43(12).
APA	Wang, W.,Bayanheshig,Y. Song,&S. Jiang and M. Pan.(2016).Beam alignment and convergence analysis of scanning beam interference lithography systems.Zhongguo Jiguang/Chinese Journal of Lasers,43(12).
MLA	Wang, W.,et al."Beam alignment and convergence analysis of scanning beam interference lithography systems".Zhongguo Jiguang/Chinese Journal of Lasers 43.12(2016).

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Beam alignment and c（1920KB）	期刊论文	作者接受稿	开放获取	CC BY-NC-SA	浏览下载