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Mineral spectrum measurement based on shortwave infrared imaging spectrometer
Sun, C.; X. Yao; J. Cui; L. Yin and J. Yang
2016
发表期刊Guangxue Xuebao/Acta Optica Sinica
卷号36期号:2
摘要The use of atomic hydrogen to clean carbon contaminants on multilayers in extreme ultraviolet lithography systems has been extensively investigated. Additional knowledge of the cleaning rate would not only provide a better understanding of the reaction mechanism but would also inform the industry's cleaning process. In this paper, which focuses on the atomic-hydrogen-based carbon contamination cleaning process, a possible mechanism for the associated reactions is studied and a cleaning model is established. The calculated results are in good agreement with the existing experimental data in the literature. The influences of the main factors such as activation energy and types of contamination - on the cleaning rate are addressed by the model. The model shows that the cleaning rate depends on the type of carbon contamination. The rate for a polymer-like carbon layer is higher than the rate for graphitic and diamond-like carbon layers. At 340 K, the rate for a polymer-like carbon layer is 10 times higher than for graphitic carbon layers. This model could be used effectively to predict and evaluate the cleaning rates for various carbon contamination types. (C) 2016 Elsevier B.V. All rights reserved.
文章类型期刊
收录类别EI
语种中文
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/57189
专题中科院长春光机所知识产出
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GB/T 7714
Sun, C.,X. Yao,J. Cui,et al. Mineral spectrum measurement based on shortwave infrared imaging spectrometer[J]. Guangxue Xuebao/Acta Optica Sinica,2016,36(2).
APA Sun, C.,X. Yao,J. Cui,&L. Yin and J. Yang.(2016).Mineral spectrum measurement based on shortwave infrared imaging spectrometer.Guangxue Xuebao/Acta Optica Sinica,36(2).
MLA Sun, C.,et al."Mineral spectrum measurement based on shortwave infrared imaging spectrometer".Guangxue Xuebao/Acta Optica Sinica 36.2(2016).
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