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Remove trefoil aberration of project objectiveusing lens surface re-polishing technology
Zhao, Y.; P. Wang; Z. Shi; Y. Gu; C. Liu and S. Men
2015
发表期刊Guangxue Xuebao/Acta Optica Sinica
卷号35期号:8
摘要It is impossible to remove the high order aberrations of minimum aberration project objective only with adjustable structures, which is a bottleneck to restrain further optimization. Ion beam figuring (IBF) instrument is widely used in optical lens manufacturing. IBF can well control low and middle frequency figuring errors to obtain high accuracy figuring polish. The wavefrint error of projection lens small scale model is analyzed using fringe Zernike polynomials, which contains a large amount trefoil aberration. One surfaces of the objective is chosen to remove designated figures using IBF to compensate trefoil aberration of the whole system. Simulation and experiment results show that trefoil aberration is well controlled, and the wavefront error is reduced from 29.6 nm (RMS) to 12.7 nm (RMS). The quality of objective is greatly improved, which proves the corrextness and applicability of this trefoil aberration compensating method. , 2015, Chinese Optical Society. All right reserved.
文章类型期刊论文
收录类别EI
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/56225
专题中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Zhao, Y.,P. Wang,Z. Shi,et al. Remove trefoil aberration of project objectiveusing lens surface re-polishing technology[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(8).
APA Zhao, Y.,P. Wang,Z. Shi,Y. Gu,&C. Liu and S. Men.(2015).Remove trefoil aberration of project objectiveusing lens surface re-polishing technology.Guangxue Xuebao/Acta Optica Sinica,35(8).
MLA Zhao, Y.,et al."Remove trefoil aberration of project objectiveusing lens surface re-polishing technology".Guangxue Xuebao/Acta Optica Sinica 35.8(2015).
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