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Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens
Xu, X.; W. Huang; S. Jia and M. Xu
2015
发表期刊Guangxue Xuebao/Acta Optica Sinica
卷号35期号:10
摘要Thermal aberration is one of the main reasons for imaging quality degradation of lithographic lens in working status. According to the structure feature of on-axis two-mirror high numerical aperture (NA) lithographic lens, a combination of element position shift and district heating method is proposed to compensate thermal aberration. The element position shift method takes advantage of element space, decentration and tilt to adjust the imaging quality; the district heating method takes advantage of the feature that the refractive index of optical material changes along with the temperature to control the temperature distribution on the lens and generate a controllable wavefront. The thermal aberration under dipole illumination model is compensated by the proposed method, and the wavefront aberration and distortion are recovered from 129.78 nm and 12.24 nm to 1.69 nm and 1.31 nm, respectively. The proposed method can basically recover the imaging quality of lens to design level. 2015, Chinese Optical Society. All right reserved.
文章类型期刊论文
收录类别EI
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/56208
专题中科院长春光机所知识产出
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GB/T 7714
Xu, X.,W. Huang,S. Jia and M. Xu. Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(10).
APA Xu, X.,W. Huang,&S. Jia and M. Xu.(2015).Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens.Guangxue Xuebao/Acta Optica Sinica,35(10).
MLA Xu, X.,et al."Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens".Guangxue Xuebao/Acta Optica Sinica 35.10(2015).
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