Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens | |
Xu, X.; W. Huang; S. Jia and M. Xu | |
2015 | |
发表期刊 | Guangxue Xuebao/Acta Optica Sinica
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卷号 | 35期号:10 |
摘要 | Thermal aberration is one of the main reasons for imaging quality degradation of lithographic lens in working status. According to the structure feature of on-axis two-mirror high numerical aperture (NA) lithographic lens, a combination of element position shift and district heating method is proposed to compensate thermal aberration. The element position shift method takes advantage of element space, decentration and tilt to adjust the imaging quality; the district heating method takes advantage of the feature that the refractive index of optical material changes along with the temperature to control the temperature distribution on the lens and generate a controllable wavefront. The thermal aberration under dipole illumination model is compensated by the proposed method, and the wavefront aberration and distortion are recovered from 129.78 nm and 12.24 nm to 1.69 nm and 1.31 nm, respectively. The proposed method can basically recover the imaging quality of lens to design level. 2015, Chinese Optical Society. All right reserved. |
文章类型 | 期刊论文 |
收录类别 | EI |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/56208 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Xu, X.,W. Huang,S. Jia and M. Xu. Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(10). |
APA | Xu, X.,W. Huang,&S. Jia and M. Xu.(2015).Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens.Guangxue Xuebao/Acta Optica Sinica,35(10). |
MLA | Xu, X.,et al."Compensation method of thermal aberration for on-axis two-mirror high NA lithographic lens".Guangxue Xuebao/Acta Optica Sinica 35.10(2015). |
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同轴两反式高NA投影光刻物镜热像差补偿方(1710KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 |
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