Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors

	Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors
	Wang, X.; C. Jin; C. Li and S. Kuang
	2015
发表期刊	Guangxue Xuebao/Acta Optica Sinica
卷号	35 期号:3
摘要	The development of industrial applications of extreme ultraviolet lithography (EUVL) severely based on surface oxidation and carbon contamination on using extreme ultraviolet (EUV) reflective mirrors. The capping layer coating on the Mo/Si multilayer is a promising method to improve the stability and service life of the reflective mirrors. The capping layer is prepared by direct current reactive magnetron sputtering. The "hysteresis loop" of oxygen flow and sputtering voltage is established, the required oxygen flow for different oxides is accurately grasped. Choosing the RuO2 and TiO2 as the capping layer materials; the different film characteristics in each state is analyzed. For TiO2 films, crystal phase, surface roughness, cross section uniformity and chemical composition are evaluated. 97.2% TiO2 content (mass fraction) of Ti-oxide is obtained; reflectivity of Mo/Si multilayer with 2 nm TiO2 as capping layer is controlled in 5%; surface roughness less than 100 pm, dense and uniform amorphous TiO2 films is fabricated to make this capping layer achieve the basic requirements of EUV. , 2015, Chinese Optical Society. All right reserved.
文章类型	期刊论文
收录类别	EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/56196
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang, X.,C. Jin,C. Li and S. Kuang. Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(3).
APA	Wang, X.,C. Jin,&C. Li and S. Kuang.(2015).Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors.Guangxue Xuebao/Acta Optica Sinica,35(3).
MLA	Wang, X.,et al."Preparation and characteristic of oxide capping-layer on extreme ultraviolet reflective mirrors".Guangxue Xuebao/Acta Optica Sinica 35.3(2015).

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