Extreme ultraviolet lithography objective design based on grouping and graphical user interface

	Extreme ultraviolet lithography objective design based on grouping and graphical user interface
	Wang, J.; L. Wang; C. Jin; L. Miao and Y. Xie
	2015
发表期刊	Guangxue Xuebao/Acta Optica Sinica
卷号	35 期号:12
摘要	Extreme ultraviolet lithography (EUVL) objective with high NA and large exposure field is the core component of lithography equipments for high volume manufacture (HVM) aiming at 22 nm node and beyond. The visual generation of the initial construction of EUVL objectives is presented based on the analysis of the valid objectives and grouping strategy. With alternation of step by step increasing NA and optimizations, /50 root mean square (RMS) composite wavefront error has been achieved in the 2 mm wide arc full field with a chord length of 26 mm. By the aids of Q-type polynomials, the maximum asphericity and diameter of mirrors have been optimized less than 45 m and 400 mm, respectively. And finally the full-field composite wavefront error is better than 0.027 RMS and the distortion is less than 1.5 nm. 2015, Chinese Laser Prees. All right reserved.
文章类型	期刊论文
收录类别	EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/56193
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang, J.,L. Wang,C. Jin,et al. Extreme ultraviolet lithography objective design based on grouping and graphical user interface[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(12).
APA	Wang, J.,L. Wang,C. Jin,&L. Miao and Y. Xie.(2015).Extreme ultraviolet lithography objective design based on grouping and graphical user interface.Guangxue Xuebao/Acta Optica Sinica,35(12).
MLA	Wang, J.,et al."Extreme ultraviolet lithography objective design based on grouping and graphical user interface".Guangxue Xuebao/Acta Optica Sinica 35.12(2015).

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