Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Extreme ultraviolet lithography objective design based on grouping and graphical user interface | |
Wang, J.; L. Wang; C. Jin; L. Miao and Y. Xie | |
2015 | |
发表期刊 | Guangxue Xuebao/Acta Optica Sinica |
卷号 | 35期号:12 |
摘要 | Extreme ultraviolet lithography (EUVL) objective with high NA and large exposure field is the core component of lithography equipments for high volume manufacture (HVM) aiming at 22 nm node and beyond. The visual generation of the initial construction of EUVL objectives is presented based on the analysis of the valid objectives and grouping strategy. With alternation of step by step increasing NA and optimizations, /50 root mean square (RMS) composite wavefront error has been achieved in the 2 mm wide arc full field with a chord length of 26 mm. By the aids of Q-type polynomials, the maximum asphericity and diameter of mirrors have been optimized less than 45 m and 400 mm, respectively. And finally the full-field composite wavefront error is better than 0.027 RMS and the distortion is less than 1.5 nm. 2015, Chinese Laser Prees. All right reserved. |
文章类型 | 期刊论文 |
收录类别 | EI |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/56193 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Wang, J.,L. Wang,C. Jin,et al. Extreme ultraviolet lithography objective design based on grouping and graphical user interface[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(12). |
APA | Wang, J.,L. Wang,C. Jin,&L. Miao and Y. Xie.(2015).Extreme ultraviolet lithography objective design based on grouping and graphical user interface.Guangxue Xuebao/Acta Optica Sinica,35(12). |
MLA | Wang, J.,et al."Extreme ultraviolet lithography objective design based on grouping and graphical user interface".Guangxue Xuebao/Acta Optica Sinica 35.12(2015). |
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极紫外光刻物镜分组可视化界面设计优化.p(4381KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 |
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