Effects and improvements of coating induced polarization aberration on lithography lens design

	Effects and improvements of coating induced polarization aberration on lithography lens design
	Shang, H.; C. Liu; W. Zhang and H. n. Chen
	2015
发表期刊	Guangxue Xuebao/Acta Optica Sinica
卷号	35 期号:1
摘要	In order to achieve high imaging requirement of projection lithography lens, the impact of polarization effects induced by coatings need to be considered and analyzed during the design process. Polarization aberration theory based on the Jones matrix is first described, then the polarization aberration of a numerical aperture (NA) of 0.75 projection lithography lens with corresponding coating is analyzed as an example. The large power and spherical aberrations induced by the coating are compensated with space and focus optimization. The scalar aberration and point spread function distortion are improved from 68.92 nm and 3.76 nm to 1.08 nm and 0.38 nm, respectively. The contrast of 90 nm dense line also increases from 0.082 to 0.876. Based on this, a method to reduce polarization aberration introduced by coating is represented, such as retardation and diattenuation. Combined films are used to control the magnitude and phase separation of the P and S component simultaneously. With this method, the contrast of the 90nm dense line is improved by 1.1%. , 2015, Chinese Optical Society. All right reserved.
文章类型	期刊论文
收录类别	EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/56186
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Shang, H.,C. Liu,W. Zhang and H. n. Chen. Effects and improvements of coating induced polarization aberration on lithography lens design[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(1).
APA	Shang, H.,C. Liu,&W. Zhang and H. n. Chen.(2015).Effects and improvements of coating induced polarization aberration on lithography lens design.Guangxue Xuebao/Acta Optica Sinica,35(1).
MLA	Shang, H.,et al."Effects and improvements of coating induced polarization aberration on lithography lens design".Guangxue Xuebao/Acta Optica Sinica 35.1(2015).

条目包含的文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
膜系引入偏振像差对投影光刻物镜设计的影响（1604KB）	期刊论文	作者接受稿	开放获取	CC BY-NC-SA	浏览下载