Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Design and fabrication of broadband holographic ion beam etching gratings | |
Wu, N.; X. Tan; H.-L. Yu and F.-C. Zhang | |
2015 | |
发表期刊 | Guangxue Jingmi Gongcheng/Optics and Precision Engineering
![]() |
卷号 | 23期号:7页码:1978-1983 |
摘要 | A broadband holographic ion beam etching grating with three different blazed angles was designed and fabricated on the same substrate. A new divisional design method for the broadband holographic ion beam etching grating was proposed and the design parameters for the grating were optimized. A reactive ion beam etching equipment was used in the pattern transfer of photosensitive resist and the divided and stepped ion beam etching technology was used in the experiment. Finally, a broadband holographic ion beam etching grating with a diameter of 60 mm60 mm worked at 200-900 nm was fabricated on a K9 substrate, which has the same phase but three different blazed angles of 9, 18 and 29 on different areas. The experimental results show that the lowest and the highest diffraction efficiencies of holographic ion beam etching grating are higher than 30% and 50%, respectively in the broadband of 200-900 nm, which is well in agreements with that of the theoretical calculation and meets the design requirements. As compared with other fabricating methods for grating, the proposed method is characterized by controllable groove shapes, larger sizes and to be easy for bulk fabrication. , 2015, Chinese Academy of Sciences. All right reserved. |
文章类型 | 期刊论文 |
收录类别 | EI |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/56109 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Wu, N.,X. Tan,H.-L. Yu and F.-C. Zhang. Design and fabrication of broadband holographic ion beam etching gratings[J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering,2015,23(7):1978-1983. |
APA | Wu, N.,X. Tan,&H.-L. Yu and F.-C. Zhang.(2015).Design and fabrication of broadband holographic ion beam etching gratings.Guangxue Jingmi Gongcheng/Optics and Precision Engineering,23(7),1978-1983. |
MLA | Wu, N.,et al."Design and fabrication of broadband holographic ion beam etching gratings".Guangxue Jingmi Gongcheng/Optics and Precision Engineering 23.7(2015):1978-1983. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
宽波段全息-离子束刻蚀光栅的设计及工艺.(393KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 请求全文 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论