Influence of grating parameters on reflectivity of Si/SiOinf2/inf high contrast gratings

	Influence of grating parameters on reflectivity of Si/SiOinf2/inf high contrast gratings
	Li, X.-S.; Y.-Q. Ning; X. Zhang; P. Jia; Y.-Y. Chen; L. Qin; Y. Liu and L.-J. Wang
	2015
发表期刊	Faguang Xuebao/Chinese Journal of Luminescence
卷号	36 期号:7 页码:806-810
摘要	In order to solve the problem of poor stability of high contrast gratings (HCGs) for 850 nm VCSEL, a new type of Si/SiOinf2/inf HCGs was put forward. The influence of grating parameters on HCG reflectivity of 850 nm was studied. The influence of the grating parameters, such as height, fill factor, duty, etching depth, angle, on the reflectivity of Si/SiOinf2/inf HCGs for 850 nm was simulated and analyzed by the finite element analysis software. For the 850 nm TE light incidence from SiOinf2/inf to the rectangular HCGs, it is found that only when the angle of gating is greater than 88, can the reflectivity of HCGs be greater than 0.995, and other parameters of HCGs have a larger tolerance. , 2015, Chines Academy of Sciences. All right reserved.
文章类型	期刊论文
收录类别	EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/55982
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li, X.-S.,Y.-Q. Ning,X. Zhang,et al. Influence of grating parameters on reflectivity of Si/SiOinf2/inf high contrast gratings[J]. Faguang Xuebao/Chinese Journal of Luminescence,2015,36(7):806-810.
APA	Li, X.-S..,Y.-Q. Ning.,X. Zhang.,P. Jia.,Y.-Y. Chen.,...&Y. Liu and L.-J. Wang.(2015).Influence of grating parameters on reflectivity of Si/SiOinf2/inf high contrast gratings.Faguang Xuebao/Chinese Journal of Luminescence,36(7),806-810.
MLA	Li, X.-S.,et al."Influence of grating parameters on reflectivity of Si/SiOinf2/inf high contrast gratings".Faguang Xuebao/Chinese Journal of Luminescence 36.7(2015):806-810.

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