Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Calibrating the pupil fill balance for hypernumerical aperture lithographic objective | |
Rui, D. W.; W. Zhang and H. J. Yang | |
2015 | |
发表期刊 | Optical Engineering
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卷号 | 54期号:9页码:6 |
摘要 | Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE) |
收录类别 | SCI ; EI |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/55395 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Rui, D. W.,W. Zhang and H. J. Yang. Calibrating the pupil fill balance for hypernumerical aperture lithographic objective[J]. Optical Engineering,2015,54(9):6. |
APA | Rui, D. W.,&W. Zhang and H. J. Yang.(2015).Calibrating the pupil fill balance for hypernumerical aperture lithographic objective.Optical Engineering,54(9),6. |
MLA | Rui, D. W.,et al."Calibrating the pupil fill balance for hypernumerical aperture lithographic objective".Optical Engineering 54.9(2015):6. |
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