Calibrating the pupil fill balance for hypernumerical aperture lithographic objective

	Calibrating the pupil fill balance for hypernumerical aperture lithographic objective
	Rui, D. W.; W. Zhang and H. J. Yang
	2015
发表期刊	Optical Engineering
卷号	54 期号:9 页码:6
摘要	Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
收录类别	SCI ; EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/55395
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Rui, D. W.,W. Zhang and H. J. Yang. Calibrating the pupil fill balance for hypernumerical aperture lithographic objective[J]. Optical Engineering,2015,54(9):6.
APA	Rui, D. W.,&W. Zhang and H. J. Yang.(2015).Calibrating the pupil fill balance for hypernumerical aperture lithographic objective.Optical Engineering,54(9),6.
MLA	Rui, D. W.,et al."Calibrating the pupil fill balance for hypernumerical aperture lithographic objective".Optical Engineering 54.9(2015):6.

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Rui-2015-Calibrating（7029KB）	期刊论文	作者接受稿	开放获取	CC BY-NC-SA	浏览下载