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Influence of substrate temperatures on the properties of GdF3 thin films with quarter-wave thickness in the ultraviolet region
Jin, J. C.; C. S. Jin; C. Li; W. Y. Deng and S. Yao
2015
发表期刊Applied Optics
卷号54期号:16页码:5117-5122
摘要High-quality coatings of fluoride materials are in extraordinary demand for use in deep ultraviolet (DUV) lithography. Gadolinium fluoride (GdF3) thin films were prepared by a thermal boat evaporation process at different substrate temperatures. GdF3 thin film was set at quarter-wave thickness (similar to 27 nm) with regard to their common use in DUV/vacuum ultraviolet optical stacks; these thin films may significantly differ in nanostructural properties at corresponding depositing temperatures, which would crucially influence the performance of the multilayers. The measurement and analysis of optical, structural, and mechanical properties of GdF3 thin films have been performed in a comprehensive characterization cycle. It was found that depositing GdF3 thin films at relative higher temperature would form a rather dense, smooth, homogeneous structure within this film thickness scale. (C) 2015 Optical Society of America
收录类别SCI
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/55287
专题中科院长春光机所知识产出
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Jin, J. C.,C. S. Jin,C. Li,et al. Influence of substrate temperatures on the properties of GdF3 thin films with quarter-wave thickness in the ultraviolet region[J]. Applied Optics,2015,54(16):5117-5122.
APA Jin, J. C.,C. S. Jin,C. Li,&W. Y. Deng and S. Yao.(2015).Influence of substrate temperatures on the properties of GdF3 thin films with quarter-wave thickness in the ultraviolet region.Applied Optics,54(16),5117-5122.
MLA Jin, J. C.,et al."Influence of substrate temperatures on the properties of GdF3 thin films with quarter-wave thickness in the ultraviolet region".Applied Optics 54.16(2015):5117-5122.
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