Design and fabrication of far ultraviolet filters based on pi-multilayer technology in high-k materials

	Design and fabrication of far ultraviolet filters based on pi-multilayer technology in high-k materials
	Wang, X. D.; B. Chen; H. F. Wang; F. He; X. Zheng; L. P. He; B. Chen; S. J. Liu; Z. X. Cui; X. H. Yang and Y. P. Li
	2015
发表期刊	Scientific Reports
卷号	5 页码:6
摘要	Application of pi-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF2 multilayer was successfully designed and fabricated and it shows high reflectance in 140-180 nm, suppressed reflectance in 120-137 nm and 181-220 nm.
收录类别	SCI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/55215
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang, X. D.,B. Chen,H. F. Wang,et al. Design and fabrication of far ultraviolet filters based on pi-multilayer technology in high-k materials[J]. Scientific Reports,2015,5:6.
APA	Wang, X. D..,B. Chen.,H. F. Wang.,F. He.,X. Zheng.,...&X. H. Yang and Y. P. Li.(2015).Design and fabrication of far ultraviolet filters based on pi-multilayer technology in high-k materials.Scientific Reports,5,6.
MLA	Wang, X. D.,et al."Design and fabrication of far ultraviolet filters based on pi-multilayer technology in high-k materials".Scientific Reports 5(2015):6.

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