Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Thermal and stress studies of the 30.4 nm Mo/Si multilayer mirror for the moon-based EUV camera | |
Li Y. P.; Zhang H. J.; Wang H. F.; He F.![]() ![]() | |
2014 | |
发表期刊 | Applied Surface Science
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ISSN | ISBN/0169-4332 |
期号 | 317页码:902-907 |
摘要 | To investigate the environmental adaptability of the Mo/Si multilayers on lunar surface, we studied the stability and stress of Mo/Si multilayers under the low and high temperature environment. The in-situ X-ray diffraction (XRD) and the ex-situ intrinsic stress are measured in the temperature range from - 135 degrees C to 600 degrees C and from 190 degrees C to 600 degrees C, respectively. The results demonstrate that the periodic structure of Mo/Si multilayers is stable between 135 degrees C and 300 degrees C. The stress is unaffected under low temperature and it gradually increases from 260 MPa to 1G MPa when the temperature changes from room temperature to 600 degrees C. Above 600 degrees C, large tensile stress leads to folds and cracks in the film. Thus, the large temperature range on lunar surface has little effect on the structure, performance and stress of the Mo/Si multilayers and the high temperature in lunar day releases the stress of the multilayer mirror. (C) 2014 Elsevier B.V. All rights reserved. |
收录类别 | SCI ; EI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/44465 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Li Y. P.,Zhang H. J.,Wang H. F.,et al. Thermal and stress studies of the 30.4 nm Mo/Si multilayer mirror for the moon-based EUV camera[J]. Applied Surface Science,2014(317):902-907. |
APA | Li Y. P..,Zhang H. J..,Wang H. F..,He F..,Wang X. D..,...&Cao J. L..(2014).Thermal and stress studies of the 30.4 nm Mo/Si multilayer mirror for the moon-based EUV camera.Applied Surface Science(317),902-907. |
MLA | Li Y. P.,et al."Thermal and stress studies of the 30.4 nm Mo/Si multilayer mirror for the moon-based EUV camera".Applied Surface Science .317(2014):902-907. |
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