Study on the fabrication of the high accuracy optical aspherical mirror with atmospheric pressure inductively coupled plasma chemical etching technology

	Study on the fabrication of the high accuracy optical aspherical mirror with atmospheric pressure inductively coupled plasma chemical etching technology
	Wang X.
	2014
发表期刊	Zhongguo Jiguang/中文 Journal of Lasers
ISSN	ISBN/02587025
卷号	41 期号:8
摘要	The inductively coupled plasma chemical etching technology operating at atmospheric pressure is used to fabricate the optical mirror whose materials are fused silica, reaction-sintered silicon carbide (RB-SiC), Si. It is focused of the primary study on the removal function of the plasma torch on different samples. The Gaussian fitting full width at half maximum (FWHM) of the removal function is 18 mm. The removal rates are 10.86, 0.82, 1.51 m/min respectively. A 100 mm caliber SiC mirror substrate is processed by using this technology, the error rate of the real obtained surface shape and virtual processed surface shape is 8.57%, and the error of converge rate is 4.7%. The experimental results show that the new technology has a potential application value on fabricating the large-aperture aspherical optical mirror in astronomy. So the inductively coupled plasma chemical etching technology operating at atmospheric pressure will have a promising foreground in the future.
收录类别	EI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/44412
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang X.. Study on the fabrication of the high accuracy optical aspherical mirror with atmospheric pressure inductively coupled plasma chemical etching technology[J]. Zhongguo Jiguang/中文 Journal of Lasers,2014,41(8).
APA	Wang X..(2014).Study on the fabrication of the high accuracy optical aspherical mirror with atmospheric pressure inductively coupled plasma chemical etching technology.Zhongguo Jiguang/中文 Journal of Lasers,41(8).
MLA	Wang X.."Study on the fabrication of the high accuracy optical aspherical mirror with atmospheric pressure inductively coupled plasma chemical etching technology".Zhongguo Jiguang/中文 Journal of Lasers 41.8(2014).

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