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Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media
Liu Y. L.; Xiong S. M.; Lou J.; Bogy D. B.; Zhang G. Y.
2014
发表期刊Journal of Applied Physics
ISSNISBN/0021-8979
卷号115期号:17页码:3
摘要A series of nanoscratch experiments is conducted using constant loading scratch profiles to apply mechanical contact stress on perpendicular magnetic recording (PMR) media to cause its magnetic signal strength decay, which is characterized by the magnetic force microscope. The dependence of the magnetic signal strength on the applied normal load is quantitatively investigated. The results indicate that an increase of the applied normal load leads to a decrease of the magnetic signal strength. In addition, in order to obtain a more complete understanding of the results, a 3D finite element model is created to calculate the stress under different normal loads. Finally, the quantitative relationship between residual shear stress and magnetic signal strength is identified. (C) 2014 AIP Publishing LLC.
收录类别SCI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/44300
专题中科院长春光机所知识产出
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GB/T 7714
Liu Y. L.,Xiong S. M.,Lou J.,et al. Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media[J]. Journal of Applied Physics,2014,115(17):3.
APA Liu Y. L.,Xiong S. M.,Lou J.,Bogy D. B.,&Zhang G. Y..(2014).Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media.Journal of Applied Physics,115(17),3.
MLA Liu Y. L.,et al."Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media".Journal of Applied Physics 115.17(2014):3.
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