Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Influence of the growth temperature of AlN nucleation layer on AlN template grown by high-temperature MOCVD | |
Chen Y. R.; Song H.; Li D. B.; Sun X. J.; Jiang H.; Li Z. M.; Miao G. Q.; Zhang Z. W.; Zhou Y. | |
2014 | |
发表期刊 | Materials Letters |
ISSN | ISBN/0167-577X |
卷号 | 114期号:26-28 |
摘要 | We studied the influence of the growth temperature of AlN nucleation layer (T-NL) on the AlN template grown by high-temperature metal-organic chemical vapor deposition (HT-MOCVD). The AlN templates were characterized by high-resolution X-ray diffractometer, atomic force microscopy and room-temperature Raman scattering spectrometer. The results revealed that the T-NL had a direct influence on the quality of the AlN template. By optimizing the T-NL at 950 degrees C, we obtained a high-quality AlN template with the full width at half maxima for the (0002) and (10-12) planes of 90 '' and 612 '', respectively. The AlN template also presented atomic level step with a root mean square (RMS) roughness of 0.133 nm. In addition, it performed excellent single crystallographic orientation along the c-axis. The growth evolution of AlN nucleation layer at different T-NL was also explained in detail. (C) 2013 Elsevier B.V. All rights reserved. |
收录类别 | SCI ; EI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/44086 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Chen Y. R.,Song H.,Li D. B.,et al. Influence of the growth temperature of AlN nucleation layer on AlN template grown by high-temperature MOCVD[J]. Materials Letters,2014,114(26-28). |
APA | Chen Y. R..,Song H..,Li D. B..,Sun X. J..,Jiang H..,...&Zhou Y..(2014).Influence of the growth temperature of AlN nucleation layer on AlN template grown by high-temperature MOCVD.Materials Letters,114(26-28). |
MLA | Chen Y. R.,et al."Influence of the growth temperature of AlN nucleation layer on AlN template grown by high-temperature MOCVD".Materials Letters 114.26-28(2014). |
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